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Development of Semiconductor Devices



The semiconductor system is undergoing significant advancements, primarily focused on scaling down to enhance both performance and integration density. As we push the boundaries of technology, device structures are evolving through various stages: from planar to Fin, and subsequently to GAA (Gate-All-Around) forms. This structural evolution is critical to overcoming the inherent limitations of traditional designs.

In response to these industry needs, our research laboratory is dedicated to exploring and implementing a wide array of innovative methods aimed at improving the characteristics and performance of semiconductor devices. Our comprehensive approach includes detailed simulations and rigorous fabrication-based validation studies. These studies not only focus on enhancing the performance of currently commercialized device structures but also delve into an in-depth analysis of their individual components. One of our primary research areas involves the optimization of device structures. By examining existing designs and identifying areas for improvement, we strive to develop more efficient and effective semiconductor devices. This involves a meticulous process of simulation to predict performance enhancements, followed by actual fabrication to validate these predictions. Our goal is to bridge the gap between theoretical improvements and practical applications, ensuring that our advancements can be seamlessly integrated into commercial products. Moreover, our research extends to the process design for implementing short channels, which are crucial for modern high-performance semiconductor devices. We explore various methodologies to simplify the creation of these short channels, thereby making the manufacturing process more efficient and cost-effective. This aspect of our research is particularly focused on finding innovative solutions to reduce production complexity and enhance yield rates.

In addition to improving existing silicon-based devices, we are actively investigating alternative channel materials that can potentially replace silicon. Our research includes identifying and evaluating various candidate materials, understanding their properties, and determining their suitability for semiconductor applications. This involves extensive experimentation with different materials to assess their performance, reliability, and compatibility with existing manufacturing processes. Furthermore, based on our findings, we develop new fabrication processes tailored to these alternative materials. This includes not only the development of new techniques but also the refinement of existing processes to accommodate the unique characteristics of the new materials. We aim to create semiconductor devices that leverage these advanced materials to achieve superior performance and efficiency.

Finally, we conduct thorough testing and verification of these newly developed devices as logic components. This involves a series of rigorous tests to ensure that the devices meet the necessary standards for functionality, reliability, and performance. By doing so, we aim to push the boundaries of what is possible with semiconductor technology, contributing to the development of next-generation electronic devices.